Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Table 4 from Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications

PDF) Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition

PDF] Moisture Resistance of Insulating Films for Compound Semiconductor Devices

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Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma - ScienceDirect

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Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

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Strength of chemical bonds occurring during plasma deposition of SiO x

PDF) Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

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Classification of the Categories of Amorphous Hydrogenated Silicon Oxynitride Films Using Infrared Spectroscopy

Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature