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PDF] 3-D PATTERNED MICROSTRUCTURES USING INCLINED UV EXPOSURE AND METAL TRANSFER MICROMOLDING
Timstar - International Catalogue 2019-20 - Type dimensions quantity-Capacity height diameter-Type voltage quantity
Reusable silicon shadow mask with sub-5 μm gap for low cost patterning - ScienceDirect
Jeung GO, Pusan National University, Busan, PNU, Department of Mechanical Engineering
金属掩膜版制造商-Shenzhen Casignals Hardware Co., Ltd.,photo etching,Laser cut,wire-electrode cutting,stamping,metal shim,filter mesh,encoder disk
Etch rate vs. inductive power at the output RF power supply for an H 2
Shadow Mask Fabrication - Potomac Photonics FabLab Examples
Etch rate vs. inductive power at the output RF power supply for an H 2
Jong Soo Ko's research works Pusan National University, Busan (PNU) and other places